Mask rule check for inspection of leading-edge photomask.
| Autor: | Sakata, Wakahiko, Yamasaki, Kiyoshi, Narukawa, Shogo, Hayashi, Naoya |
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| Zdroj: | Proceedings of SPIE; Nov2005 Part 2, Issue 1, p59924E-59924E-9, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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