Advanced photomask repair technology for 65nm lithography (4).
| Autor: | Itou, Yasutoshi, Tanaka, Yoshiyuki, Suga, Osamu, Sugiyama, Yasuhiko, Hagiwara, Ryoji, Takahashi, Haruo, Takaoka, Osamu, Kozakai, Tomokazu, Matsuda, Osamu, Suzuki, Katsumi, Okabe, Mamoru, Kikuchi, Syuichi, Uemoto, Atsushi, Yasaka, Anto, Adachi, Tatsuya, Nishida, Naoki |
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| Zdroj: | Proceedings of SPIE; Nov2005 Part 2, Issue 1, p59924Y-59924Y-8, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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