Fabrication of mesoporous silica for ultra-low-k interlayer dielectrics.
| Autor: | Fujii, Nobutoshi, Kohmura, Kazuo, Nakayama, Takahiro, Tanaka, Hirofumi, Hata, Nobuhiro, Seino, Yutaka, Kikkawa, Takamaro |
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| Zdroj: | Proceedings of SPIE; Nov2005 Part 2, Issue 1, p60020N-60020N-9, 9p |
| Databáze: | Complementary Index |
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