Lithography and CD performance of advanced MEBES mask pattern generators.
| Autor: | Chabala, Jan M., Cole, Damon M., Pearce-Percy, Henry T., Phillips, Wayne, Lu, Maiying, Weaver, Suzanne, Alexander, David W., Coleman, T., Sauer, Charles A., Abboud, Frank E. |
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| Zdroj: | Proceedings of SPIE; Nov2000, Issue 1, p200-215, 16p |
| Databáze: | Complementary Index |
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