Printing characteristics of proximity x-ray lithography and comparison with optical lithography for 100-nm node and below.
| Autor: | Hasegawa, Masaki, Nakayama, Yoshinori, Yamaguchi, K., Terasawa, Tsuneo, Matsui, Yasuji |
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| Zdroj: | Proceedings of SPIE; Nov2000, Issue 1, p96-104, 9p |
| Databáze: | Complementary Index |
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