Photomask CD correlation of an optical linewidth measurement tool and a scanning electron microscope with reference to a Stylus NanoProfilometer.

Autor: Kasprowicz, Bryan S., Eynon Jr., Benjamin G., Morrison, Troy B., Wang, Chih-Yu
Zdroj: Proceedings of SPIE; Nov2000 Part 2, Issue 1, p338-349, 12p
Databáze: Complementary Index