Accelerated yield learning in agressive lithography.
Autor: | Monahan, Kevin M., Ashkenaz, Scott M., Chen, Xing, Lord, Patrick J., Merrill, Mark A., Quattrini, Rich, Wiley, James N. |
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Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p492-503, 12p |
Databáze: | Complementary Index |
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