Accelerated yield learning in agressive lithography.

Autor: Monahan, Kevin M., Ashkenaz, Scott M., Chen, Xing, Lord, Patrick J., Merrill, Mark A., Quattrini, Rich, Wiley, James N.
Zdroj: Proceedings of SPIE; Nov2000 Part 2, Issue 1, p492-503, 12p
Databáze: Complementary Index