Mechanism of single-layer 193-nm dissolution inhibition resist.
| Autor: | Yan, Zhenglin, Houlihan, Francis M., Reichmanis, Elsa, Nalamasu, Omkaram, Reiser, Arnost, Dabbagh, Gary, Hutton, Richard S., Osei, Dan, Sousa, Jose, Bolan, Kevin J. |
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| Zdroj: | Proceedings of SPIE; Nov2000, Issue 1, p127-135, 9p |
| Databáze: | Complementary Index |
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