New bottom antireflection coating approach for KrF lithography at sub-150-nm design rule.
| Autor: | Iguchi, Etsuko, Komano, Hiroshi, Nakayama, Toshimasa |
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| Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p521-530, 10p |
| Databáze: | Complementary Index |
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