Minimization of the iso-dense bias in chemically amplified 193-nm positive resists: influence and monitoring of the diffusion well.
| Autor: | Mortini, Benedicte P., Gally, Severine, Sassoulas, Pierre-Olivier, Prola, Alain, Paniez, Patrick J. |
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| Zdroj: | Proceedings of SPIE; Nov2000, Issue 1, p74-90, 17p |
| Databáze: | Complementary Index |
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