Characteristic study of electron beam stabilization for deep-UV photoresists.
Autor: | Kim, Myoung-Soo, Choi, Jae-Hak, Rho, Chi H., Hong, Min-Jong, Jun, Bum-Jin, Gil, Myung-Goon, Kim, Bong-Ho, Ahn, Dong-Jun, Ross, Matthew F., Wong, Selmer S. |
---|---|
Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p782-792, 11p |
Databáze: | Complementary Index |
Externí odkaz: |