Characteristic study of electron beam stabilization for deep-UV photoresists.

Autor: Kim, Myoung-Soo, Choi, Jae-Hak, Rho, Chi H., Hong, Min-Jong, Jun, Bum-Jin, Gil, Myung-Goon, Kim, Bong-Ho, Ahn, Dong-Jun, Ross, Matthew F., Wong, Selmer S.
Zdroj: Proceedings of SPIE; Nov2000 Part 2, Issue 1, p782-792, 11p
Databáze: Complementary Index