Thick-film positive DUV photoresist for implant layer application.
| Autor: | Mori, J. Michael, Thackeray, James W., Xu, Cheng-Bai, Orsula, George W., Prettyman, Elizabeth, Bell, Rosemary, Routh, Robert M. |
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| Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p843-853, 11p |
| Databáze: | Complementary Index |
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