Extending the performance of KrF laser for microlithography by using novel F2 control technology.
| Autor: | Zambon, Paolo, Gong, Mengxiong, Carlesi, Jason, Padmabandu, Gunasiri G., Binder, Mike, Swanson, Ken, Das, Palash P. |
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| Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p1461-1470, 10p |
| Databáze: | Complementary Index |
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