New silica glass (AQF) for 157-nm lithography.
| Autor: | Ikuta, Yoshiaki, Kikugawa, Shinya, Kawahara, T., Mishiro, H., Shimodaira, Noriaki, Yoshizawa, Shuhei |
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| Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p1510-1514, 5p |
| Databáze: | Complementary Index |
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