Status of ArF lithography for the 130-nm technology node.
Autor: | Ronse, Kurt G., Vandenberghe, Geert, Jaenen, Patrick, Delvaux, Christie, Vangoidsenhoven, Diziana, Van Roey, Frieda, Pollers, Ingrid, Maenhoudt, Mireille, Goethals, Anne-Marie, Pollentier, Ivan K., Vleeming, Bert, van Ingen Schenau, Koen, Heskamp, Barbra, Davies, Guy, Finders, Jo, Niroomand, Ardavan |
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Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p410-422, 13p |
Databáze: | Complementary Index |
Externí odkaz: |