130-nm KrF lithography for DRAM production with 0.68-NA scanner.
| Autor: | Kawamura, Eiichi, Nagai, Kouichi, Kanemitsu, Hideyuki, Tabata, Yasuko, Inoue, Soichi |
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| Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p927-934, 8p |
| Databáze: | Complementary Index |
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