New modified silica glass for 157-nm lithography.
| Autor: | Ikuta, Yoshiaki, Kikugawa, Shinya, Kawahara, T., Mishiro, H., Okada, Kaname, Ochiai, Katsuhiro, Hino, Keigo, Nakajima, T., Kawata, M., Yoshizawa, Shuhei |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p564-570, 7p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|