Elements of an advanced pattern generator for 130- to 100-nm maskmaking.
| Autor: | Chakarian, Varoujan, Sauer, Charles A., Shamoun, Bassam, Chilese, Frank, Trost, David, Zywno, Marek, Hofmann, Ulrich, Teitzel, Robin, Prior, Richard, Raymond III, Frederick, Ghanbari, Abe, Abboud, Frank E. |
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| Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p580-593, 14p |
| Databáze: | Complementary Index |
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