Results from a new laser pattern generator for 180-nm photomasks.
Autor: | Vikholm, Tomas, Kjellberg, Lars, Askebjer, Per, Haddleton, Steven, Larsson, Johan, Bjuggren, Mans |
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Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p624-630, 7p |
Databáze: | Complementary Index |
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