Results from a new laser pattern generator for 180-nm photomasks.

Autor: Vikholm, Tomas, Kjellberg, Lars, Askebjer, Per, Haddleton, Steven, Larsson, Johan, Bjuggren, Mans
Zdroj: Proceedings of SPIE; Nov2000 Part 2, Issue 1, p624-630, 7p
Databáze: Complementary Index