Computer simulation of Nb2O5/SiO2 sputtering process for narrow-band optical filter.
Autor: | Ouyang, Mike X., Kinney, L. D., Onyiriuka, Emmanuel C. |
---|---|
Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p458-461, 4p |
Databáze: | Complementary Index |
Externí odkaz: |