Low-k etch/ash for copper dual damascene.
| Autor: | Suemasa, Tomoki, Nishino, Masaru, Inazawa, Kouichiro, Balasubramanian, Vaidyanathan, Nishimura, Eiichi |
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| Zdroj: | Proceedings of SPIE; Nov2000 Part 2, Issue 1, p281-286, 6p |
| Databáze: | Complementary Index |
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