Comparison of reflective mask technologies for soft x-ray projection lithography.
| Autor: | Tennant, Donald M., Bjorkholm, John E., Eichner, Ludwig, Freeman, Richard R., Jewell, Tanya E., MacDowell, Alastair A., Pastalan, J. Z., Szeto, L. H., Waskiewicz, Warren K., White, Donald L., Windt, David L., Wood II, Obert R. |
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| Zdroj: | Proceedings of SPIE; Nov1992, Issue 1, p91-104, 14p |
| Databáze: | Complementary Index |
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