Low-damage anisotropic radical-beam ion-beam etching and selective chemical etching of focused-ion-beam-damaged GaAs substrates.
| Autor: | Skidmore, Jay A., Spiers, Guy D., English, John H., Xu, Zheng, Prater, Craig B., Coldren, Larry A., Hu, Evelyn L., Petroff, Pierre M. |
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| Zdroj: | Proceedings of SPIE; Nov1992, Issue 1, p268-279, 12p |
| Databáze: | Complementary Index |
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