Design of synchrotron x-ray lithography beamlines.
| Autor: | Oberschmidt, James M., Rippstein, Robert P., Ruckel, Raymond R., Chen, Alek C., Granlund, John C., Palumbo, Alfred E. |
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| Zdroj: | Proceedings of SPIE; Nov1992, Issue 1, p324-337, 14p |
| Databáze: | Complementary Index |
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