Novel DNQ PACs for high-resolution i-line lithography.
| Autor: | Brunsvold, William R., Eib, Nicholas K., Lyons, Christopher F., Miura, Steve S., Plat, Marina V., Dammel, Ralph R., Evans, O. B., Rahman, M. D., Khanna, Dinesh N., Jain, Sangya, Lu, Ping-Hung, Ficner, Stanley A. |
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| Zdroj: | Proceedings of SPIE; Nov1992, Issue 1, p273-285, 13p |
| Databáze: | Complementary Index |
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