Wafer FAB experience of implementing 50-kV vector e-beam mask writer and dry etch process for 130-nm technology node generation.
| Autor: | Kim, Won D., Bennett, Robert D., Ma, Z. Mark |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p353-361, 9p |
| Databáze: | Complementary Index |
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