Mask-related distortions of modified fused silica reticles for 157-nm lithography.
| Autor: | Mikkelson, Andrew R., Abdo, Amr Y., Cotte, Eric P., Sohn, Jaewoong, Engelstad, Roxann L., Lovell, Edward G. |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p914-925, 12p |
| Databáze: | Complementary Index |
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