REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology.
| Autor: | Baik, Ki-Ho, Dean, Robert L., Mueller, Mark, Lu, Maiying, Lem, Homer Y., Osborne, Stephen, Abboud, Frank E. |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p401-411, 11p |
| Databáze: | Complementary Index |
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