Numerical investigation of EUV mask contact layer defect printability at the 30-nm technology node.
| Autor: | Abdo, Amr Y., Yan, Pei-yang |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p725-732, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Abdo, Amr Y., Yan, Pei-yang |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p725-732, 8p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|