Thermomechanical modeling of the pin-chucked EUV reticle during exposure.

Autor: Wei, Alexander C., Martin, Carl J., Beckman, William A., Mitchell, John W., Engelstad, Roxann L., Lovell, Edward G., Blaedel, Kenneth L.
Zdroj: Proceedings of SPIE; Nov2002, Issue 1, p743-753, 11p
Databáze: Complementary Index