Improving sub-150-nm lithography and etch CD-SEM correlations to AFM and electrical test.
| Autor: | Solecky, Eric P., Mayer, Jason, Archie, Charles N. |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p473-483, 11p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|