Spectroscopic CD metrology for sub-100-nm lithography process control.
| Autor: | Mieher, Walter D., Dziura, Thaddeus G., Chen, Xuemei, DeCecco, Paola, Levy, Ady |
|---|---|
| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p957-965, 9p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|