Thin organic bottom antireflective coatings for 193 nm lithography.
| Autor: | Bhave, Mandar, Meador, James D., Claypool, James B., Deshpande, Shreeram V., Akers, Jill, Lindgren, Anne |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p1074-1084, 11p |
| Databáze: | Complementary Index |
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