Aliphatic platforms for the design of 157-nm chemically amplified resists.
| Autor: | Ito, Hiroshi, Truong, Hoa D., Okazaki, Masaki, Miller, Dolores C., Fender, Nicolette, Breyta, Gregory, Brock, Phillip J., Wallraff, Gregory M., Larson, Carl E., Allen, Robert D. |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p18-28, 11p |
| Databáze: | Complementary Index |
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