High-resolution fluorocarbon-based resist for 157-nm lithography.
| Autor: | Fedynyshyn, Theodore H., Mowers, William A., Kunz, Roderick R., Sinta, Roger F., Sworin, Michael, Goodman, Russell B. |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p29-40, 12p |
| Databáze: | Complementary Index |
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