Factors influencing the properties of fluoropolymer-based resists for 157-nm lithography.
| Autor: | Taylor, Gary N., Xu, Cheng-Bai, Teng, Gary, Leonard, JoAnne, Szmanda, Charles R., Lawrence, William, Nur, Sassan, Brown, Kirk W., Stephen, Al |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p51-57, 7p |
| Databáze: | Complementary Index |
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