Investigation of a fluorinated ESCAP-based resist for 157-nm lithography.
| Autor: | Cho, Sungseo, Klauck-Jacobs, Axel, Yamada, Shintaro, Xu, Cheng-Bai, Leonard, JoAnne, Zampini, Anthony |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p522-532, 11p |
| Databáze: | Complementary Index |
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