E-beam curing effects on the etch and CD-SEM stability of 193-nm resists.
| Autor: | Padmanaban, Munirathna, Alemy, Eric L., Dammel, Ralph R., Kim, Woo-Kyu, Kudo, Takanori, Lee, Sang-Ho, McKenzie, Douglas S., Orsi, Aldo, Rahman, Dalil, Chen, Wan-Lin, Sadjadi, Reza M., Livesay, William R., Ross, Matthew F. |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p606-614, 9p |
| Databáze: | Complementary Index |
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