Model-based OPC for phase-shifter edge lithography.
| Autor: | Futatsuya, Hiroki, Chijimatsu, Tatsuo, Takayoshi, Minami, Tsujimura, Ryo, Komura, Yoshihisa, Ito, Yoshio, Asai, Satoru |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p1148-1155, 8p |
| Databáze: | Complementary Index |
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