Minimization of image placement errors in chromeless phase-shift mask lithography.
| Autor: | Fritze, Michael, Tyrrell, Brian, Cann, Susan G., Carney, Chris, Blachowicz, Betty A., Brzozowy, David J., Kocab, Thomas, Bowdoin, Scott, Rhyins, Peter D., Progler, Christopher J., Martin, Patrick M. |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p426-436, 11p |
| Databáze: | Complementary Index |
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