Early mask results of KRS-XE and current progress in improving sensitivity and etch resistance.
| Autor: | Deverich, Christina, Watts, Andrew J., Rabidoux, Paul A., Cardinali, Thomas J., Aaskov, William A., Levin, Peter, Huang, Wu-Song, Moreau, Wayne M., Angelopoulos, Marie, Petrillo, Karen E., Madeiros, David |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p229-240, 12p |
| Databáze: | Complementary Index |
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