In-situ optical emission spectroscopic examination of chrome etch for photomasks.
| Autor: | Anderson, Rex, Sandlin, Nicole L., Buie, Melisa J., Su, Clyde, Agarwal, Ashish, Brooks, Cynthia J., Huang, Yi-Chiau, Stoehr, Brigitte C. |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p312-322, 11p |
| Databáze: | Complementary Index |
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