Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography.
| Autor: | Watanabe, Kunio, Yamabe, Osamu, Kanda, Noriyoshi, Kim, J., Uchida, Noboru, Irie, Shigeo, Suganaga, Toshifumi, Itani, Toshiro |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p444-451, 8p |
| Databáze: | Complementary Index |
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