Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool simulation.
| Autor: | Barberet, Alexandra, Buck, Peter D., Fanget, Gilles L., Toublan, Olivier, Richoilley, Jean-Charles, Tissier, Michel |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p460-470, 11p |
| Databáze: | Complementary Index |
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