Advanced FIB mask repair technology for 100 nm/ArF lithography.
| Autor: | Hagiwara, Ryoji, Yasaka, Anto, Aita, Kazuo, Takaoka, Osamu, Koyama, Yoshihiro, Kozakai, Tomokazu, Doi, Toshio, Muramatsu, Masashi, Suzuki, Katsumi, Sugiyama, Yasuhiko, Sawaragi, Hiroshi, Okabe, Mamoru, Shinohara, Shoji, Hasuda, Masakatsu, Adachi, Tatsuya, Morikawa, Yasutaka, Nishiguchi, Masaharu, Sato, Yasushi, Hayashi, Naoya, Ozawa, Toshiya |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p1056-1064, 9p |
| Databáze: | Complementary Index |
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