Preliminary study of 65 nm node alternating phase-shift mask fabrication.
| Autor: | Hosono, Kouji, Ishiwata, Naoyuki, Asai, Satoru, Maruyama, Hiroshi, Miyahara, Yutaka, Sanki, Syuichi, Yamashita, Youhei, Hotta, Yuichiro, Furukawa, Tomohiko, Naitou, Minoru, Miyashita, Hiroyuki, Noguchi, Shigeru |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p1273-1280, 8p |
| Databáze: | Complementary Index |
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