Raster Shaped Beam Pattern Generation for 70 nm Photomask Production.
| Autor: | Newman, Thomas H., Finklestein, Ira, Kao, Huei-Mei, Krishnaswami, Sriram, Long, Darryn, Lozes, Richard L., Pearce-Percy, Henry T., Sagle, Allan L., Varner, Jeffrey K., Winter, Stacey, Gesley, Mark A., Abboud, Frank E. |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p168-176, 9p |
| Databáze: | Complementary Index |
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