Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes.
| Autor: | Choi, Yo-Han, Park, Jong-Rak, Sung, Moon-Gyu, Yang, Seung-Hune, Kim, Soon-Ho, Lee, Ho-June, Lee, Jeong-Yun, Jang, Il-Yong, Kim, Yong-Hoon, Choi, Sung-Woon, Yoon, Hee-Sun, Sohn, Jung-Min |
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| Zdroj: | Proceedings of SPIE; Nov2002, Issue 1, p819-825, 7p |
| Databáze: | Complementary Index |
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