Compact recycled beam source for XRL and EUVL exposure tools.
Autor: | Piestrup, Melvin A., Powell, Michael W., Cremer, J. Theodore, Lombardo, Louis W., Kaplin, V. V., Mihal'chuk, A. A., Uglov, S. R., Zabaev, V. N., Skopik, D. M., Silzer, R. M., Retzlaff, G. A. |
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Zdroj: | Proceedings of SPIE; Nov1998 Part 2, Issue 1, p450-463, 14p |
Databáze: | Complementary Index |
Externí odkaz: |