Effect of the dissolution contrast on process margins in 193-nm lithography.
| Autor: | Takahashi, Makoto, Kishimura, Shinji, Naito, Takuya, Ohfuji, Takeshi, Sasago, Masaru |
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| Zdroj: | Proceedings of SPIE; Nov1998 Part 2, Issue 1, p195-204, 10p |
| Databáze: | Complementary Index |
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